ALOHA™ Advanced Precursors  [ Return towards  Electronics  ]

ALOHA™’s precursors come in a comprehensive package including dedicated, OEM-qualified delivery systems, ultra-high purity canisters, and extremely tight specifications, backed by its world class Air Liquide-BALAZS analytical expertise.   ALOHA™ also has some proprietary process solutions, such as AHEAD or TSA for the deposition of Low Temperature silicon nitride, TDEAA as a non-pyrophoric TMA substitute, or ToRuS for C-free, high adhesion Ru ALD.  

	Low-T-SiN					Low-k
	high-k					Metals & Barriers